[PATCH] renderproto: Fix compositeglyph dst position. eliminate use of mask-format

[Chris Wilson]

On Tue, May 26, 2015 at 01:55:09PM -0700, Keith Packard wrote:
> Change the definition of composite glyphs from using an explicit
> dst-x/dst-y location to match current implementation which uses the
> dx/dy values from the first glyphitem for the destination location.
> 
> Define the source pattern origin to align with that first glyph
> location.
> 
> Eliminate use of the mask-format in composite glyphs to clean up
> rendering.

Pardon? You are changing the expected rendering from being a union of
the glyphs to rendering individual glyphs. That's a big change for the
users who expect a union of the glyph path when specifying a mask - plus
the effect the mask has for allowing combining a mixture of glyph
formats without unwanted fringing.
-Chris

-- 
Chris Wilson, Intel Open Source Technology Centre